SiOxCyHz-TiO2 Nanocomposite Films Prepared by a Novel PECVD-Sputtering Process

Recently, there has been growing interest in the incorporation of particles plasma deposited thin films to creation multifunctional surfaces. In this work a new hybrid methodology based on enhanced chemical vapor deposition (PECVD) hexamethyldisiloxane combined reactive sputtering TiO2 is proposed for preparation SiOxCyHz-TiO2 composite films. Specifically, effect proportion O2 environment morphology, structure, elemental composition, wettability, thickness and surface roughness, was studied. Agglomerates (16-83 μm) were detected into organosilicon matrix with concentration particulates percentage oxygen feed. general, elevation angle contact surfaces as supply increased. Interpretation terms influence rate oxidation species.